2021, February 19th @12:30 PM (GMT+1)
Screen printing of fine line front side patterns on Silicon solar cells represents a highly amibitious challenge, as finest contact lines with optimal uniformity, low lateral resistance and ideally no interruptions have to be realized on a textured, rough surface. Great progress has been done with respect to gradually reduce the printable width of fine line front side contacts within the last decade. Intense efforts of suppliers and research institutions with respect to the development and optimization of high-precision fine mesh screens, pastes and machine technology have enabled this impressive evolution.
The experience from Current R&D activities at Fraunhofer ISE focus on establishing a stable and reproducible printing process for contacts below 20 µm width as well as developing new approaches to increase the production throughput. This presentation will provide a short overview regarding the evolution of fine line screen printing for Silicon solar cells and present the latest results from R&D activities at the Frauhofer ISE Photovoltaic Technolgy Evaluation Center (PV-TEC) regarding flatbed screen printing and other printing approaches like rotary screen printing.